Published papers
Makabe, Toshiaki
141-160 items (total 198)
Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering
- Author
- S. Kuroiwa, T. Mine, T. Yagisawa, and T. Makabe
- Publication Title
- Magazine name J.Vac.Sci.Technol.B Start Page 2218-21 (Publication Date）2005）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Influence of driving frequency on oxygen atom density in O2 radio frequency capacitively coupled plasma
- Author
- T. Kitajima, K. Noro, T. Nakano, and T. Makabe
- Publication Title
- Magazine name J.Phys.D Start Page 2670-6 (Publication Date）2004）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Comparison of direct numerical procedure and Monte Carlo technique to determine the charging effects in submicron structures
- Author
- Z. Lj. Petrovic, S. Sakadzic, N. Spasojevic, J. Matsui, and T. Makabe
- Publication Title
- Magazine name Materials Sci. Forum Start Page 9-14 (Publication Date）2004）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Funtional separation in two frequency operation of an Inductively Coupled Plasma
- Author
- T. Denda, Y. Miyoshi, T. Goto, K. Komukai, Z. Lj. Petrovic, and T. Makabe
- Publication Title
- Magazine name J.Appl.Phys. Start Page 870-6 (Publication Date）2004）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Negative charge injection to wafer in a pulsed two-frequency capacitively coupled plasma for oxide etching: diagnostics for an interface by emission selected-computerized tomography
- Author
- T. Ohmori, T. Goto, and T. Makabe
- Publication Title
- Magazine name J.Phys.D Start Page 2223-31 (Publication Date）2004）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Modeling of N2-H2 capacitively coupled plasma for low-k material etching
- Author
- C-H. Shon and T. Makabe
- Publication Title
- Magazine name IEEE Trans. on Plasma Sci. Start Page 390-8 (Publication Date）2004/04）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Prediction of a radial variation of plasma structure and ion distributions in the wafer interface in 2-frequency capacitively coupled plasma
- Author
- T. Yagisaw, K. Maeshige, T. Shimada, and T. Makabe
- Publication Title
- Magazine name IEEE Trans. on Plasma Sci. Start Page 90-100 (Publication Date）2004/02）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Magnetron plasma structure with strong magnetic field
- Author
- E. Shidoji and T. Makabe
- Publication Title
- Magazine name Thin Solid Films Start Page 27-31 (Publication Date）2003）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Control of charging in high aspect ratio plasma etching of integrated circuits
- Author
- Z.Lj. Petrovic and T. Makabe
- Publication Title
- Magazine name TELSIKS Start Page 119-26 (Publication Date）2003）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Negative charge injection to a positively charged SiO2 hole exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma in CF4/Ar
- Author
- T. Ohmori, T. Goto, T. Kitajima, and T. Makabe
- Publication Title
- Magazine name Appl.Phys.Lett. Start Page 4637-9 (Publication Date）2003/11）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Negative mobilities of electron in radio frequency fields
- Author
- S. Dujko, Z. M. Raspopovic, Z. Lj. Petrovic, and T. Makabe
- Publication Title
- Magazine name IEEE Trans. on Plasma Sci. Start Page 711-6 (Publication Date）2003/08）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Temporal velocity distribution of positive and negative ions incident on a wafer in a pulsed two-frequency capacitively coupled plasma in CF_4_/Ar for SiO_2_ etching
- Author
- T. Yagisawa and T. Makabe
- Publication Title
- Magazine name IEEE Trans. on Plasma Science Start Page 521-7 (Publication Date）2003/08）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Electron transport coefficients in SiH4 and Si2H6 in dc and rf fields
- Author
- T. Shimada, Y.N akamura, Z. Lj. Petrovic, and T. Makabe
- Publication Title
- Magazine name J.Phys.D: Appl.Phys. Start Page 1936-46 (Publication Date）2003/07）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Transition between capacitive and inductive mode in inductively coupled plasma observed by emission computerized tomography
- Author
- Y. Miyoshi, Z. Lj. Petrovic, and T. Makabe
- Publication Title
- Magazine name IEEE Trans. on Plasma Science Start Page 130-1 (Publication Date）2002）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Optical computerized tomography of the E-H transition in inductively coupled plasmas in Ar and Ar-CF4 mixtures
- Author
- Y. Miyoshi, Z. Lj. Petrovic, and T. Makabe
- Publication Title
- Magazine name J. Phys. D: Appl. Phys. Start Page 454-61 (Publication Date）2002）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Diagnostics of a wafer interface of a pulsed two frequency capacitively oupled plasma for oxide etching by emission selected computerized tomography
- Author
- T. Fujita and T. Makabe
- Publication Title
- Magazine name Plasma Sources Sci & Technol Start Page 142-5 (Publication Date）2002）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Functional design of a pulsed two-frequency capacitively coupled plasma in CF4/Ar for SiO2 etching
- Author
- K. Maeshige, G. Washio, T. Yagisawa, and T. Makabe
- Publication Title
- Magazine name J.Appl.Phys. Volume 91(Issue 12) Start Page 9494-501 (Publication Date）2002）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Kinetic phenomena in electron transport in radio frequency fields
- Author
- Z. Lj. Petrovic, Z. M. Raspopovic, S. Dujko, and T. Makabe
- Publication Title
- Magazine name Appl.Surf.Sci. Start Page 1-25 (Publication Date）2002）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Development of optical computerized tomography in CCP and ICP for plasma etching
- Author
- T. Makabe and Z. Lj. Petrovic
- Publication Title
- Magazine name Appl.Surf.Sci. Start Page 88-114 (Publication Date）2002）
- Authorship Category
- Joint Work
- Publication Category
- Research paper (scientific journal)
- Peer-review Status
- With
Future TCAD system for nanometer-scale-device manufacturing using plasma etching
- Author
- T. Makabe, J. Matsui, and K. Maeshige
- Publication Title
- Magazine name AIPP Start Page 2263-71 (Publication Date）2001）
- Authorship Category
- Joint Work
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- Research paper (scientific journal)
- Peer-review Status
- With