Presentations
Nakano, Nobuhiko
121-140 items (total 179)
Three dimensional profiles of a pulsed inductively coupled plasma in Ar and CF_4/Ar
- Speaker
- K. Hioki, N. Itazu, N. Nakano, T. Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 52th Annual Gaseous Electronics Conference（Venue (5-8 October 1999,Norfolk, USA)） Dates 1999.10 - 1999.10
- Presentation Format
- International presentation
- Language of Publication
- English
- Conference Category
- Poster presentation
Effect of electron and ion transport on the charge build-up of a microscopic structure exposed to plasma
- Speaker
- J. Matsui,T. Makabe, N. Nakano
- Conference Title
- [Conference Category International presentation] Conference Title 52th Annual Gaseous Electronics Conference（Venue (5-8 October 1999,Norfolk, USA)） Dates 1999.10 - 1999.10
- Presentation Format
- International presentation
- Language of Publication
- English
- Conference Category
- Oral presentation (general)
Simulation of Time Modulated Dual Frequency Capacitively-Coupled Plasmas
- Speaker
- Nobuhiko Nakano, T. Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 52th Annual Gaseous Electronics Conference（Venue (5-8 October 1999,Norfolk, USA)） Dates 1999.10 - 1999.10
- Presentation Format
- International presentation
- Language of Publication
- English
- Conference Category
- Oral presentation (general)
Modeling of time modulated dual frequency capacitively coupled plasma
- Speaker
- Nobuhiko Nakano and Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 14th International symposium on Plasma Chemistry（Venue Prague, Czech Republic） Dates 1999.08.02 - 1999.08.02
- Presentation Format
- International presentation
- Conference Category
- Oral presentation (general)
2D images of two frequency capacitively coupled plasmas at VHF
- Speaker
- T. Kitajima, Y. Takeo, N. Nakano, T. Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
Two dimensional profiles of a pulsed capacitively coupled plasma
- Speaker
- Y. Takeo, T. Kitajima, N. Nakano, T. Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
2D Selfconsistent Simulation of a DC magnetron Discharge and Its Target Erosion Profile
- Speaker
- K. Okazawa, N. Nakano, T. Makabe, E. Shidoji
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
Three dimensional Space-resolved optical-emission spectroscopy in an inductively coupled CF4/Ar plasma
- Speaker
- H. Hirata, K. Hioki, N. Nakano,Z. Petrovi'c, T. Makabe, S. Matsumura
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
Effect of electron and ion transport on the charge build-up of the microscopic structure in CCP etcher
- Speaker
- J. Matsui, N. Nakano, T. Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
Influence of a low frequency bias voltage on a wafer in inductively coupled plasma
- Speaker
- H. Kobayashi, N. Nakano, T. Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
RF plasma characteristics in a micro-cell in Xe by using RCT model
- Speaker
- M. Kurihara, N. Nakano, T. Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
Dependence of driving frequency on capacitively coupled plasma in CF4
- Speaker
- S.Segawa, M.Kurihara, Nobuhiko Nakano, Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title 51th Annual Gaseous Electronics Conference, and 4th International Conference on Reactive Plasmas Organizer (19-22 October 1998, Maui, USA) Dates 1998.10 - 1998.10
- Organizer
- (19-22 October 1998, Maui, USA)
- Presentation Format
- International presentation
Toward Charging Free Plasma Processes: phase space modeling between pulsed plasma and microtrench
- Speaker
- Toshiaki Makabe, Jun Matsui, Mari Shibata, Nobuhiko Nakano
- Conference Title
- [Conference Category International presentation] Conference Title 3rd International Symposium on Plasma Process-Induced Damage Organizer (4-5 June 1998, Honolulu, USA) Dates 1998.06 - 1998.06
- Organizer
- (4-5 June 1998, Honolulu, USA)
- Presentation Format
- International presentation
Electron and Ion Transport in a charged micro-trench
- Speaker
- Jun Matsui, Nobuhiko Nakano, and Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title The 193rd meeting of The Electrochemical Society, Organizer (3-8 May 1998, San Diego, USA) Dates 1998.05 - 1998.05
- Organizer
- (3-8 May 1998, San Diego, USA)
- Presentation Format
- International presentation
Effect of pulse modulated plasma on a charge build-up of the microscopic structure
- Speaker
- Jun Matsui, Nobuhiko Nakano, and Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title SYMPOSIUM on DRY PROCESS Organizer (11-13 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)85-90 Dates 1997.11 - 1997.11
- Organizer
- (11-13 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)85-90
- Presentation Format
- International presentation
Modeling of two frequency capacitively-coupled plasma in Ar/CF4 gas mixture
- Speaker
- Nobuhiko Nakano, Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title SYMPOSIUM on DRY PROCESS Organizer (11-13 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)223-228 Dates 1997.11 - 1997.11
- Organizer
- (11-13 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)223-228
- Presentation Format
- International presentation
Effect of pulsed plasma in reactive ion etcher
- Speaker
- Mari Shibata, Jun Matsui, Nobuhiko Nakano, Toshiaki Makabe, and Moritaka Nakamura
- Conference Title
- [Conference Category International presentation] Conference Title SYMPOSIUM on DRY PROCESS Organizer (12-14 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)77-82 Dates 1997.11 - 1997.11
- Organizer
- (12-14 November 1997, Tokyo, Japan), The Institute of Electrical Engineers of Japan, (1997)77-82
- Presentation Format
- International presentation
Topographic Charging Model in an rf Capacitively Coupled Plasma by the Boltzmann Equation
- Speaker
- Jun Matsui, Nobuhiko Nakano, Mari Shibata, and Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title American Vacuum Society 44th National Symposium Organizer (20-24 Oct 1997, San Jose, USA) Dates 1997.10 - 1997.10
- Organizer
- (20-24 Oct 1997, San Jose, USA)
- Presentation Format
- International presentation
Solving 'Topographic Dependent Charging' by a Pulsed Plasma
- Speaker
- Mari Shibata, Jun Matsui, Nobuhiko Nakano, and Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title American Vacuum Society 44th National Symposium Organizer (20-24 Oct 1997, San Jose, USA) Dates 1997.10 - 1997.10
- Organizer
- (20-24 Oct 1997, San Jose, USA)
- Presentation Format
- International presentation
Two Dimensional Modeling of Two-Frequency-Operated-Plasma in Ar by Relaxation Continuum Model
- Speaker
- Nobuhiko Nakano, and Toshiaki Makabe
- Conference Title
- [Conference Category International presentation] Conference Title American Vacuum Society 44th National Symposium Organizer (20-24 Oct 1997, San Jose, USA) Dates 1997.10 - 1997.10
- Organizer
- (20-24 Oct 1997, San Jose, USA)
- Presentation Format
- International presentation